GE Additive and ORNL agreement

From left to right: Christine Furstoss, chief technology officer, GE Additive; Daniel Simmons, assistant secretary, US Department of Energy; Moe Khaleel, sssociate laboratory director and Chris Schuppe, general manager, engineering, GE Additive.
From left to right: Christine Furstoss, chief technology officer, GE Additive; Daniel Simmons, assistant secretary, US Department of Energy; Moe Khaleel, sssociate laboratory director and Chris Schuppe, general manager, engineering, GE Additive.

GE Additive says that it has entered into a five-year cooperative research and development agreement with Oak Ridge National Laboratory (ORNL).

The agreement will cover the processes, materials and software required to help scale up additive manufacturing (AM) technology and supersedes an existing agreement in place since 2012. The companies say that they will use GE Additive equipment and materials to building on existing research into simulation, monitoring and quality control, on both electron beam melting (EBM) and direct metal laser melting (DMLM) systems. GE and ORNL will also look into materials modeling and development, and ondustrialization and commercialization of equipment and processes.

‘We’re really looking forward to applying the collective brainpower and expertise from both organizations to addressing the challenges around industrialization, but we also have an eye on the future,’ said Josh Mook, innovation leader, GE Additive. ‘The next wave of additive technology is already upon us – whether that’s binder jet or rapid advances in software – so, we’re excited to see where the next five years will take us.’

This story uses material from GE Additive, with editorial changes made by Materials Today. The views expressed in this article do not necessarily represent those of Elsevier.